Thin Film Growth by Pulsed Laser Deposition

The image depicts the process of thin film growth via pulsed laser deposition. On the left side of the image, a solid target material is visible, while on the right side, a substrate held at 650°C is positioned. A pulsed laser beam with a wavelength of 532 nm is focused onto the material (La0.5Sr0.5CoO3) to generate a plasma. By adjusting the background gas pressure to approximately 0.05 mbar using O2, the plasma is confined. The plasma moves from left to right and condenses, nucleates, and grows as a thin film on the substrate.
by Sharath Rameshbabu